年产1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

三氟化氮 (Nitrogen Trifluoride），化学式NF3，是⼀种强氧化剂。作为
在微电⼦⼯业中，三氟化氮是⼀种优良的等离⼦蚀刻⽓体，在半导体芯⽚、平板显⽰器、光纤、光伏电池等制造领域，三氟化氮主要⽤作等离⼦蚀刻⽓体和反应腔清洗剂。它还可以⽤于⾼能化学激光器，通过与氢反应在瞬间放出⼤量热來实现其应⽤。三氟化民还可⽤作⾼能燃料，并且在⽕箭发射中作為氧化剂和推进剂使⽤.

Nitrogen trifluoride, kemikari formula NF3, ioxidizing agent yakasimba. Seyakakosha maindasitiri gasi akakosha, ine huwandu hwakawanda hwekushandisa.
Muindasitiri yemicroelectronics, nitrogen trifluoride igasi rakanaka replasma etching; Mu semiconductor chip, float panel display, optical fiber, photovoltaic cells nedzimwe nzvimbo dzekugadzira, nitrogen trifluoride inonyanya kushandiswa se plasma etching gas uye reaction cavity cleaning agent.
Inogona zvakare kushandiswa mune yakakwirira-simba kemikari lasers kuti iwane mashandisiro ayo nekuita nehydrogen kuburitsa huwandu hukuru hwekupisa nekukasira. Nitrogen trifluoride inoshandiswawo semafuta ane simba guru uye seoxidizer uye inosimudzira mukuvhurwa kwemaroketi.